Space Nanotechnology Laboratory
(MIT Kavli Institute for Astrophysics and Space Research)

Space
1930 sq-ft of laboratory space comprised of:

• 1430 sq-ft Class 100 space
• 500 sq-ft support space

Equipment

• Interference Lithography System (IL) (MIT-built system)
• Interference Lithography System, Scanning Beam (SBIL) (MIT-built system)
• UV Lithography, OAI Model 30
• Wafer Developer, SVG Wafertrack Model 8132
• Spin Coater/Dryer, Specialty Coating Systems Model P6204 A
• Bake Oven, VWR Model 1601
• UV Ozone Cleaner, Jelight Model 42
• Reactive Ion Etcher, Plasma Therm Model 770
  
• Full Wafer Imaging Interferometer (RIE Endpoint), LES Model 1000-IS
  
• Gold Fountain-Bath Pulse-Plating System, Marks and Associates
  
• Gold/Nickel Fountain-Bath Pulse-Plating System, (MIT-built system)
  
• Acid Spin-Etch System, Materials and Technologies RotoEtch III
  
• Three-Axis Adhesive Dispensing System, CAMELOT Model 1414
  
• Bonding Aligner, (MIT-built system)
  
• Optical Emission Spectrometer, EG&G Model 1420
  
• Optical Microscopes (2), Leitz Ergolux, Wild M3Z
  
• Surface Profilometer, Dektak III
  
• Thin Film Analyzer, X-ray Fluorescence, Fisons Instruments/Kevex Omicron
  
• Thin Film Stress Monitor, Ionic Systems Model 3000
  
• Analytical Microbalance, Denver Instruments Model A-200DS
  
• Workstation Computers, (15 of various types)
  
• Leak Checker, Helium, Balzers Model HLT 150
  
• Residual Gas Analyzer (3), Leybold Transpector C100F
  
• Furnace, NEY Vulcan 3-550
  
• Signal Analyzer, HP 35670A
  
• Optical Surface Analyzer, Shack-Hartmann, (MIT-built system)
  
• Optic Foil Assembly Truss, (MIT-built system)

Companion Facilities

NanoStructures Laboratory (NSL)
(Research Laboratory of Electronics)

Space
2,000 sq-ft of laboratory space comprised of:

• 1,000 sq-ft Class 10 space
• 1,000 sq-ft Class 100

Equipment

• Electron-beam Lithography (2 systems)
  IBM Vector Scan VS-6, 50 KV
  Raith 150 high-resolution vector-scan
• Interference Lithography 3 Systems (100 nm pitch)
  (Custom System)
• Holographic Phase-shifting Interferometer
  (Custom System)
• Zone-Plate-Array Lithography
  (Custom System)
• X-ray Lithography Systems
  (3 Custom Systems)
• IBBI x-ray mask aligner
  (Custom System)
• UV Lithography
  Tamarack ELHG 200-350
• Talbot-effect Lithography
  (Custom System)
• Reactive Ion Etchers
  Perkin Elmer Model 3140
  Plasma Therm Model 790
• Plasma Etcher
  Technics Plasma Etch II
  MARCH CS-1701
• Surface Profiler
  Veeco DEKTAK3
• Optical Microscopes (3)
  Leitz, Orthoplan, Metalloplan
• Scanning Electron Microscope
  Zeiss (LEO) 982 Gemini
• Ellipsometer
  Gaertner L116B
• Substrate Cleaning Station
  Interlab
• Evaporators
  Ebeam: Airco Temescal BJD 1800
• Gold Electroplating Systems
  (Custom System)
• Ion Miller
  Ion Tech
• RF Sputter System
  MRC
• Linnik Interferometer
  Leitz
• Imaging Interferometer
  Wyko Model 400
• Optical Spectrometer
  EG&G/PARC Model 1235
• Atomic Force - Scanning Tunneling Microscope
  Digital Instruments Nanoscope
• UV Ozone Cleaner
  Jelight Model
• Workstation Computers (20)
  Various types
  

Integrated Circuits Laboratory (ICL)
(Microsystems Technology Laboratories)

Space
7,910 sq-ft of laboratory space comprised of:

• 2,800 sq-ft Class 10 space
• 4,000 sq-ft support space
• 1110 sq-ft characterization and electrical testing space

Equipment

An extensive suite of thin film deposition, etch, lithography, and metrology equipment, specialized in CMOS processing.

Technology Research Laboratory (TRL)
(Microsystems Technology Laboratories)

Space
3,600 sq-ft of laboratory space comprised of:

• 2,200 sq-ft Class 100 space
• 1,400 sq-ft support space