Mark L. Schattenburg

Senior Research Scientist,
MIT Kavli Institute of Astrophysics and Space Research
Director, Space Nanotechnology Laboratory
Associate Director, NanoStructures Laboratory
Senior Research Staff, Microsystems Technology Laboratories

Mailing address
Dr. Mark L. Schattenburg
70 Vassar Street, Room 37-487
Cambridge, MA 02139-4307
(Tel) 617-253-3180
(Fax) 617-452-2888
marks@space.mit.edu

Dr. Mark L. Schattenburg is Senior Research Scientist in the MIT Kavli Institute of Astrophysics and Space Research. He is Director of the Space Nanotechnology Laboratory, Associate Director of the NanoStructures Laboratory and Senior Research Affiliate with the Microsystems Technology Laboratories. His principal interests are in the area of micro/nanofabrication technology, optical and x-ray interferometry, advanced lithography including optical, x-ray, electron-beam and nano-imprint, nano-metrology, x-ray optics and instrumentation, x-ray astronomy, high-resolution x-ray spectroscopy and space physics instrumentation utilizing nanotechnology.

He has made numerous contributions to advanced lithography. He is co-inventor of the attenuated (or halftone) phase-shift mask (PSM) that is licensed to semiconductor manufacturers around the world and is the only PSM option widely used for production of computer chips. He was a pioneer of x-ray lithography (XRL) and responsible for a number of innovations, including the first use of refractory metal absorbers, the "microgap" x-ray mask and the flip-bonded x-ray mask. He was the first to demonstrate the replication of sub-100 nm lines by XRL with out-of-contact masking. He is also the co-inventor of spatial-phase-locked electron-beam lithography (SPLEBL) which led to the world's most accurate electron-beam writer.

He is a leading expert on grating fabrication by interference lithography and pioneered advanced homodyne and heterodyne fringe locking technology, multi-level resist processing and achromatic interference lithography. He is the inventor of scanning-beam interference lithography and developed the "Nanoruler," the world's most precise grating patterning tool.

Early in his career he worked in the Soft X-ray and Electron Spectroscopy Laboratory of Prof. Burton L. Henke at the University of Hawaii. Later he participated in the mission planning and operations, data reduction and analysis for the MIT Focal Plane Crystal Spectrometer (FPCS) on the Einstein Observatory (HEAO-2) x-ray satellite, which performed high-resolution x-ray spectroscopy. During this period he analyzed the spectrum of the Crab Nebula and discovered the first reported interstellar x-ray absorption line.

He pioneered nanostructure fabrication technology for ten NASA missions applied to advanced instrumentation in x-ray astronomy, solar physics and Earth magnetospheric imaging. His group is responsible for the fabrication of hundreds of nanometer-period transmission gratings for high-resolution x-ray spectroscopy in the High Energy Transmission Grating Spectrometer (HETGS) on the Chandra X-ray Observatory; gratings for Solar EUV spectroscopy on the SOHO, GOES and Solar Dynamics Observatory missions; and deep-UV nanofilters for atom cameras on the IMAGE and TWINS missions.

He is a member of the NASA Chandra Science and Instrument Development Teams, the Constellation-X Facility Science Team, the Micro-Arcsecond X-ray Imaging Mission (MAXIM) and Generation X study teams. He is also a member of the Steering Committee of the International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, serving as Program Chair in 2003.

Dr. Schattenburg has a B.S. degree in physics from the University of Hawaii in 1978 and a Ph.D. in physics from MIT in 1984. He was appointed Postdoctoral Associate at MIT in 1984, progressing to Senior Research Scientist in 2004. He has published over 140 papers and holds six patents. He is a member of the Optical Society of America, the American Vacuum Society, SPIE-The International Society for Optical Engineering, the Institute of Electrical and Electronic Engineers and the American Society for Precision Engineering. He was awarded the 2003 BACUS Prize by SPIE for the development of phase shift mask technology and a R&D 100 award in 2004 for the invention of the Nanoruler.

Also, please check out the web site of his grandfather, Dr. Otto Lee Schattenburg.