The MIT Nanoruler, which can pattern gratings hundreds of times faster and more accurately than previous technology.
A 400 nm-period grating written by the Nanoruler on a 300 mm-diameter silicon wafer.
High-precision tooling under development for assembly of segmented x-ray foil optics. Assembly accuracy on the order of 1 micron and repeatability on the order of 50 nm has been demonstrated.
Lithographically patterned and micro-machined silicon 'micro-combs' used for precision assembly of x-ray foil optics.
Scanning electron micrograph of a 200 nm-period x-ray diffraction grating with 7º blaze angle, evaporated with 5 nm of chromium and 40 nm of gold. Interference lithography and anisotropic etching of silicon are used to achieve extremely high fidelity patterns and surface smoothness of well under 0.2 nm.
A periodic nanostructure fabricated by overlaying three 200 nm period gratings. The grating layers each have 25 nm linewidth and are placed 50 nm apart.
High-resolution x-ray spectra of supernovae E0102-72 from the Chandra x-ray telescope.
Movie frame of the magnetospheric storm of Aug. 12, 2000 taken by a neutral atom telescope on IMAGE.