The MIT Nanoruler/Scanning Beam Interference Lithography

A Brief History of Gratings and the Making of the MIT Nanoruler (pdf)

 

A 300 mm wafer patterend with a 400 nm-period grating on the Nanoruler air bearing stage.

A 300 mm wafer patterend with a 400 nm-period grating on the Nanoruler air bearing stage.

Related publications:

Optimization and Temperature Mapping of an Ultra-High Thermal Stability Environmental Enclosure pdficon_small
Y. Zhao, D. L. Trumper, R. K. Heilmann, and M. L. Schattenburg
Precision Engineering 34, 164-170 (2010).

Spatial-Frequency Multiplication with Multilevel Interference Lithography pdficon_small
C.-H. Chang, Y. Zhao, R. K. Heilmann, and M. L. Schattenburg
J. Vac. Sci. Technol. B 26, 2135-2138 (2008).

Fabrication of 50 nm-Period Gratings with Multilevel Interference Lithography pdficon_small
C.-H. Chang, Y. Zhao, R. K. Heilmann, and M. L. Schattenburg
Opt. Lett. 33, 1572 (2008).

Phase Control in Multiexposure Spatial Frequency Multiplication pdficon_small
Y. Zhao, C.-H. Chang, R. K. Heilmann, and M. L. Schattenburg
J. Vac. Sci. Technol. B 25, 2439 (2007).

Doppler Writing and Linewidth Control for Scanning Beam Interference Lithography pdficon_small
J. C. Montoya, C.-H. Chang, R. K. Heilmann, and M. L. Schattenburg
J. Vac. Sci. Technol. B 23, 2640 (2005).

Dimensional Metrology for Nanometer-Scale Science and Engineering: Towards Sub-Nanometer Accurate Encoders (Invited) pdficon_small
R. K. Heilmann, C. G. Chen, P. T. Konkola, and M. L. Schattenburg
Nanotechnology 15, S504 (2004).

Nanometer-Level Repeatable Metrology Using the Nanoruler pdficon_small
P. T. Konkola, C. G. Chen, R. K. Heilmann, C. Joo, J. C. Montoya, C.-H. Chang, and M. L. Schattenburg
J. Vac. Sci. Technol. B 21, 3097 (2003).

Nanometer-Accurate Grating Fabrication with Scanning Beam Interference Lithography pdficon_small
C. G. Chen, P. T. Konkola, R. K. Heilmann, C. Joo, and M. L. Schattenburg
Proc. SPIE 4936, 126 (2002).

A Generalized Scanning Beam Interference Lithography System for Patterning Gratings with Variable Period Progression pdficon_small
G. S. Pati, R. K. Heilmann, P. T. Konkola, C. Joo, C. G. Chen, E. Murphy, and M. L. Schattenburg
J. Vac. Sci. Technol. B 20, 2617 (2002).

Beam Alignment for Scanning Beam Interference Lithography pdficon_small
C. G. Chen, R. K. Heilmann, C. Joo, P. T. Konkola, G. S. Pati, and M. L. Schattenburg
J. Vac. Sci. Technol. B 20, 3071 (2002).

Progress Toward a General Grating Pattern Technology Using Phase-Locked Scanning Beams pdficon_small
M. L. Schattenburg, C. G. Chen, R. K. Heilmann, P. T. Konkola, and G. S. Pati
Optical Spectrocopic Techniques and Instrumentation for Atmospheric and Space Research IV, S. C. Barden and M. G. Mlynczak (eds.),
Proc. SPIE 4485, 378 (2002).

Image Metrology and System Controls for Scanning Beam Interference Lithography (Invited) pdficon_small
C. G. Chen, P. T. Konkola, R. K. Heilmann, G. S. Pati, and M. L. Schattenburg
J. Vac. Sci. Technol. B 19, 2335 (2001).

Digital Heterodyne Interference Fringe Control System pdficon_small
R. K. Heilmann, P. T. Konkola, C. G. Chen, G. S. Pati, and M. L. Schattenburg
J. Vac. Sci. Technol. B 19, 2342 (2001).

Beam Steering System and Spatial Filtering Applied to Interference Lithography pdficon_small
P. T. Konkola, C. G. Chen, R. K. Heilmann, and M. L. Schattenburg
J. Vac. Sci. Technol. B 18, 3282 (2000).

Relativistic Corrections in Displacement Measuring Interferometry pdficon_small
R. K. Heilmann, P. T. Konkola, C. G. Chen, and M. L. Schattenburg
J. Vac. Sci. Technol. B 18, 3277 (2000).

Comments are closed